Yun-Lung Ho

Title: Innovations of Inventor Yun-Lung Ho

Introduction

Yun-Lung Ho is a prominent inventor based in Miaoli, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, particularly in the development of advanced slurry compositions. With a total of 7 patents to his name, his work has had a substantial impact on semiconductor manufacturing processes.

Latest Patents

One of his latest patents is a "System for chemical mechanical polishing of Ge-based materials and devices." This invention involves a CMP slurry composition that provides high selectivity for Ge or SiGe over dielectric materials while minimizing recess formation. The composition includes an oxidant and a germanium removal rate enhancer, which consists of methylpyridine compounds. Additionally, the slurry may contain etching inhibitors, abrasives, surfactants, and various acids or bases to enhance its effectiveness.

Another notable patent is the "Method of selectively removing tungsten over silicon oxide." This invention features a slurry composition that combines abrasive particles, halogen oxide, and nitroxide compounds. The synergistic effect of these components allows for efficient removal of tungsten from substrates containing silicon oxide. The patent also outlines the use of this slurry composition in polishing methods.

Career Highlights

Yun-Lung Ho has worked with several notable companies, including Uwiz Technology Co., Ltd. and Taiwan Semiconductor Manufacturing Company. His experience in these organizations has allowed him to refine his expertise in semiconductor technologies and polishing techniques.

Collaborations

Throughout his career, Yun-Lung Ho has collaborated with talented individuals such as Song-Yuan Chang and Chia-Jung Hsu. These partnerships have contributed to the advancement of his research and innovations in the field.

Conclusion

Yun-Lung Ho's contributions to the field of chemical mechanical polishing have established him as a key figure in semiconductor innovation. His patents reflect a commitment to improving manufacturing processes and enhancing material performance.