Yun-Lin Wu

Title: Innovations of Yun-Lin Wu

Introduction

Yun-Lin Wu is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of integrated circuit manufacturing. With a total of 3 patents to his name, his work focuses on improving the manufacturability of circuit layouts.

Latest Patents

One of his latest patents is a method for improving circuit layout for manufacturability. This method involves receiving a layout of an integrated circuit (IC) that has a first region interposed between two second regions. The layout includes a first layer with first features and second and third layers containing second and third features in the first region. The second and third features collectively form cut patterns for the first features. The method further includes modifying the second and third features using a mask house tool, resulting in modified features that collectively form modified cut patterns for the first features. The modifications meet specific conditions, such as the total spacing between adjacent modified features being greater than that of the original features, and the total length of the modified features being smaller than that of the original features.

Career Highlights

Yun-Lin Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work there has allowed him to apply his innovative methods in a practical setting, contributing to advancements in IC manufacturing.

Collaborations

Some of his coworkers include Cheng-Cheng Kuo and Chia-Ping Chiang, who have collaborated with him on various projects within the company.

Conclusion

Yun-Lin Wu's contributions to integrated circuit manufacturing through his innovative patents highlight his expertise and commitment to advancing technology in this field. His work continues to influence the industry positively.