Yun-Ju Fan

Title: Innovations by Yun-Ju Fan in Semiconductor Technology

Introduction

Yun-Ju Fan is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor structure that enhances performance and efficiency.

Latest Patents

Yun-Ju Fan holds a patent for a semiconductor structure and method for forming the same. This patent describes a semiconductor structure that includes a first fin structure, a second fin structure, and a third fin structure over a substrate. The second fin structure is strategically located between the first and third fin structures. Additionally, the semiconductor structure features a fin isolation structure formed between the first and third fin structures, along with a gate structure that spans all three fin structures and the fin isolation structure. The design also incorporates multiple epitaxial structures formed over the fin structures, a dielectric material over the epitaxial structures, and a contact connected to the first and third epitaxial structures.

Career Highlights

Yun-Ju Fan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to further his research and development efforts in semiconductor technology.

Collaborations

Throughout his career, Yun-Ju Fan has collaborated with talented individuals such as Lin-Yu Huang and Sheng-Tsung Wang. These collaborations have contributed to the advancement of semiconductor innovations.

Conclusion

Yun-Ju Fan's contributions to semiconductor technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor in the field. His innovative designs continue to shape the future of semiconductor structures.