Yun Jong Jang

Title: The Innovative Contributions of Inventor Yun Jong Jang

Introduction

Yun Jong Jang, an accomplished inventor based in Seoul, South Korea, has made notable advancements in the field of etching techniques. With a focus on the application of dry etching methods, Jang has secured a patent that showcases his ingenuity and expertise, contributing significantly to technological innovation.

Latest Patents

Jang's patent, titled "Dry etching method using potential control of grid and substrate," delineates a sophisticated procedure for etching that emphasizes the control of various potentials. This method involves the adsorption of first radicals from a generated plasma onto an etching target's surface, followed by the irradiation of ion beams from a second plasma. This dual-step approach enhances the desorption process, allowing for a precise manipulation of the material's surface atomic layers. The intricate design of his methodology offers potential improvements in manufacturing processes, particularly in the semiconductor industry.

Career Highlights

Currently affiliated with the Research and Business Foundation at Sungkyunkwan University, Jang has established himself as a key figure in research and development. His career reflects a commitment to advancing technologies that impact various sectors, particularly those reliant on precise etching techniques for production and innovation.

Collaborations

Jang collaborates closely with Geun Young Yeom, a fellow researcher who shares a dedication to exploring the intricacies of material processing. Their partnership enables the merging of ideas and insights, enhancing the overall contributions to the field of etching and semiconductor development.

Conclusion

Yun Jong Jang's advancements in dry etching methods highlight his contributions to modern technology. His innovative patent and dedication to research position him as a significant figure in the field, promising further developments that could revolutionize manufacturing techniques in the future.