This inventor holds 2 USPTO granted patents. Top assignee: Fujitsu Corporation. Active years: 1996-2001.
Location History:
- Kawasaki, JP (1996)
- Kanagawa, JP (2001)
Company Filing History:
Years Active: 1996-2001
Title: Yumiko Hamada: Innovator in Semiconductor Technology
Introduction
Yumiko Hamada is a prominent inventor based in Kanagawa, Japan. She has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase her innovative approach to manufacturing methods.
Latest Patents
Hamada's latest patents include a semiconductor device manufacturing method that involves the sequential formation of a first insulating film, a first semiconductor film, and a second insulating film on a semiconductor substrate. This method also details the creation of a resist mask with a window, allowing for the formation of holes through overetching using halogen compound gas. Additionally, she has developed a method for manufacturing a semiconductor device that includes preparing a substrate with surface convexities and concavities, generating plasma from organic silicon, and depositing a planarized insulating film through plasma chemical vapor deposition.
Career Highlights
Yumiko Hamada is currently employed at Fujitsu Corporation, where she continues to advance her research and development in semiconductor technologies. Her work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Hamada collaborates with notable colleagues, including Takako Furuse and Manabu Hayashi, contributing to a dynamic team focused on innovation in the semiconductor industry.
Conclusion
Yumiko Hamada's contributions to semiconductor technology through her patents and work at Fujitsu Corporation highlight her role as a leading inventor in her field. Her innovative methods are paving the way for advancements in semiconductor manufacturing.