Yulong Li

Title: Yulong Li - Innovator in Photolithography Technology

Introduction

Yulong Li is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of photolithography, particularly through his innovative patent that enhances exposure efficiency in semiconductor manufacturing.

Latest Patents

Yulong Li holds a patent for a "Reticle shape correction apparatus and photolithography tool using same." This apparatus is designed to correct the shape of a reticle, featuring components such as suckers, a sucker mounting frame, and a pneumatic control system. The design allows for the suckers to retain or release the reticle by suction without obstructing trapezoidal exposure fields. This innovation ensures that a light beam can fully incident on the reticle, resulting in improved exposure efficiency. The apparatus is also designed to be mounted separately from the photolithography tool, minimizing the weight load on the reticle and preventing additional external vibrations.

Career Highlights

Yulong Li is associated with Shanghai Micro Electronics Equipment (Group) Co., Ltd., where he applies his expertise in photolithography technology. His work has been instrumental in advancing the capabilities of semiconductor manufacturing equipment.

Collaborations

Yulong Li collaborates with his coworker, Lingyu Li, contributing to the development of innovative solutions in their field.

Conclusion

Yulong Li's contributions to photolithography technology through his innovative patent demonstrate his commitment to enhancing semiconductor manufacturing processes. His work continues to influence the industry positively.