The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 29, 2018

Filed:

Nov. 28, 2014
Applicant:

Shanghai Micro Electronics Equipment Co., Ltd., Shanghai, CN;

Inventors:

Lingyu Li, Shanghai, CN;

Yulong Li, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70741 (2013.01); G03F 7/707 (2013.01); G03F 7/70783 (2013.01); H01L 21/6838 (2013.01);
Abstract

An apparatus for correcting the shape of a reticle, including: suckers; a sucker mounting frame; and a pneumatic control system, wherein the sucker mounting frame is disposed above a reticle stage, the suckers are mounted on a bottom of the sucker mounting frame in a manner of being spaced apart from one another; and the pneumatic control system is configured to control the suckers to retain the reticle by suction or to release the reticle. The suckers are so arranged that they do not block trapezoidal exposure fields of view on the reticle, thereby allowing a light beam to be fully (100%) incident on the reticle, which results in improved exposure efficiency. The apparatus is mounted separately from a photolithography tool by which it is employed, enabling a lower weight load on the reticle. Additionally, the apparatus is not in contact with any component disposed in the photolithography tool and will not introduce additional external vibration to the tool.


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