Kodaira, Japan

Yuko Matsui

This inventor holds 1 USPTO granted patent. Top assignee: Transphorm Japan, Inc.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuko Matsui. Retrieved from https://idiyas.com/inventor/yuko-matsui-1vmhoslh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Yuko Matsui: Innovator in Semiconductor Technology

Introduction

Yuko Matsui is a prominent inventor based in Kodaira, Japan. She has made significant contributions to the field of semiconductor technology. Her innovative work has led to the development of a unique semiconductor apparatus that enhances device performance.

Latest Patents

Yuko Matsui holds 1 patent for her invention titled "III-n device with dual gates and field plate." This semiconductor apparatus includes a substrate, a first semiconductor layer made of a nitride semiconductor, and a second semiconductor layer formed on the first layer. The design features first and second gate electrodes, a source electrode, and a drain electrode, all formed on the second semiconductor layer. Additionally, an interlayer insulation film and a field plate are incorporated into the design. The configuration of the gate electrodes and their connection to the source electrode is a key aspect of her invention.

Career Highlights

Yuko Matsui is currently employed at Transphorm Japan, Inc., where she continues to push the boundaries of semiconductor technology. Her work is characterized by a commitment to innovation and excellence in her field.

Collaborations

Yuko collaborates with talented colleagues, including Yuji Ito and Yoshiyuki Kotani. Their combined expertise fosters a creative environment that drives technological advancements.

Conclusion

Yuko Matsui's contributions to semiconductor technology exemplify her dedication to innovation. Her patent for the III-n device with dual gates and field plate showcases her ability to develop cutting-edge solutions in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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