This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Innovations of Yukiya Saitou
Introduction
Yukiya Saitou is a notable inventor based in Hokkaido, Japan. He has made significant contributions to the field of substrate processing technology. His work focuses on reducing the workload required for learning processes in substrate manufacturing.
Latest Patents
Yukiya Saitou holds a patent for a "Substrate processing apparatus, data processing method, and data processing program." This invention aims to reduce the workload required for learning work. The substrate processing apparatus includes a reservoir feature generating unit that receives first time-series sensor data and outputs a reservoir feature. Additionally, it features a learning unit that learns a weight parameter during a learning period. This weight parameter ensures that prediction result data correlates with acquired second time-series sensor data. The predicting unit performs calculations on the reservoir feature during a prediction period, while the determining unit assesses the state of the substrate manufacturing process by comparing prediction result data with the acquired second time-series sensor data. Yukiya Saitou's innovative approach enhances efficiency in substrate processing.
Career Highlights
Yukiya Saitou is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to develop and refine his innovative ideas in substrate processing technology.
Collaborations
Yukiya collaborates with talented coworkers, including Takuro Tsutsui and Yuki Kataoka. Their combined expertise contributes to the advancement of technology in their field.
Conclusion
Yukiya Saitou's contributions to substrate processing technology demonstrate his commitment to innovation and efficiency. His patent reflects a significant advancement in the industry, showcasing his skills as an inventor.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
