Substrate processing apparatus, data processing method, and data processing program

Abstract

A workload required for learning work is reduced. A substrate processing apparatus includes a reservoir feature generating unit configured to receive acquired first time-series sensor data and output a reservoir feature; a learning unit configured to learn, in a learning period, a weight parameter so that prediction result data obtained by performing calculations on the reservoir feature under the weight parameter correlates with acquired second time-series sensor data; a predicting unit configured to perform calculations, in a prediction period, on the reservoir feature output from the reservoir feature generating unit in response to the acquired first time-series sensor data being input, under the learned weight parameter, to output prediction result data; and a determining unit configured to determine, in the prediction period, a state of the substrate manufacturing process by comparing the prediction result data with acquired second time-series sensor data.