Company Filing History:

11 out of 8,889

Nikon Corporation

Years Active: 1978-2014

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20 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8749753 - Movable body apparatus, exposure apparatus and optical system unit, and device manufacturing method (2014-06-10),

2. 6583597 - Stage apparatus including non-containing gas bearings and microlithography apparatus comprising same (2003-06-24),

3. 6570641 - Projection exposure apparatus (2003-05-27),

4. 6317196 - Projection exposure apparatus (2001-11-13),

5. RE37352 - Projection optical apparatus (2001-09-04),

6. 6049372 - Exposure apparatus (2000-04-11),

7. 6040096 - Mask substrate, projection exposure apparatus equipped with the mask (2000-03-21),

8. 5929973 - Apparatus and method for simultaneously transferring a mask pattern to (1999-07-27),

9. 5894056 - Mask substrate, projection exposure apparatus equipped with the mask (1999-04-13),

10. 5617211 - Exposure apparatus (1997-04-01),

11. 5337097 - Projection optical apparatus (1994-08-09),

12. 4803373 - Conveyor arm apparatus with gap detection (1989-02-07),

13. 4776693 - Foreign substance inspecting system including a calibration standard (1988-10-11),

14. 4770531 - Stage device with levelling mechanism (1988-09-13),

15. 4723846 - Optical path length compensating optical system in an alignment apparatus (1988-02-09),

Title: **Yukio Kakizaki: Innovator in Optical and Microlithography Technologies**

Introduction

Yukio Kakizaki is a prominent inventor based in Yokohama, Japan, known for his significant contributions to optical systems and microlithography technologies. With a remarkable portfolio of 20 patents, he has made substantial advancements in the fields of device manufacturing and exposure apparatus, making his work essential in the precision industry.

Latest Patents

Among Yukio Kakizaki's latest patents are innovations such as the Movable Body Apparatus, Exposure Apparatus and Optical System Unit, and Device Manufacturing Method. One of his notable inventions involves the upper end of a static gas bearing member of a wafer-side seal unit, connected in an airtight state via bellows. This innovative design maintains a vacuum environment, significantly reducing the size of the exposure apparatus and simplifying access to the wafer stage. Furthermore, his stage apparatus includes non-containing gas bearings, enabling precise movement within a microlithography system, ideal for work in vacuum environments.

Career Highlights

Kakizaki has been associated with prominent companies such as Nikon Corporation and Nippon Kogaku K.K., where he applied his expertise to develop cutting-edge technologies. His career has been dedicated to enhancing the efficiency and effectiveness of optical and manufacturing processes through his inventive solutions.

Collaborations

Throughout his career, Yukio Kakizaki has collaborated with esteemed professionals in the field, including Hiroshi Tanaka and Hiroshi Shirasu. These collaborations have fostered an environment of innovation, contributing to the development of technologies that are critical to modern manufacturing and optics.

Conclusion

Yukio Kakizaki stands out as a significant figure in the realm of optical and microlithography innovations. His extensive patent portfolio and collaborations illustrate his commitment to advancing technology in a way that transforms manufacturing practices. As the industry continues to evolve, the impact of his work will undoubtedly pave the way for future innovations.

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