Location History:
- Kanagawa, JP (1996 - 2005)
- Kanagawa-ken, JP (1996 - 2007)
- Tokyo, JP (2006 - 2007)
Company Filing History:
Years Active: 1996-2007
Title: Innovations of Yukiko Nishioka
Introduction
Yukiko Nishioka is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of substrate processing, holding a total of 10 patents. Her work focuses on enhancing the efficiency and effectiveness of metal film formation through innovative methods.
Latest Patents
One of her latest patents is a method for processing substrates. This method allows for the secure formation of a metal film by electroless plating on an exposed surface of a base metal, such as interconnects. It increases throughput while preventing the formation of voids in the base metal. The process involves cleaning the substrate's surface with a specialized cleaning solution and applying a catalyst before forming the metal film.
Another notable patent is a cleaning apparatus and method that enables cleaning and drying to occur within the same device. This innovation minimizes the risk of reverse contamination after the drying process. The apparatus includes a supporting device for the object being cleaned and a cleaning cup that prevents splashing of the cleaning liquid.
Career Highlights
Yukiko Nishioka is currently employed at Ebara Corporation, where she continues to develop her innovative ideas. Her work has significantly impacted the field of substrate processing, making her a key figure in her industry.
Collaborations
She has collaborated with notable coworkers, including Ryoichi Shinjo and Ichiro Kamiya, contributing to various projects and advancements in their field.
Conclusion
Yukiko Nishioka's contributions to substrate processing through her innovative patents highlight her expertise and dedication to advancing technology. Her work continues to influence the industry and inspire future innovations.