Yamanashi, Japan

Yuki Tanabe

USPTO Granted Patents = 2 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: Yuki Tanabe: Innovator in Gas Processing and Silicon Film Crystallization

Introduction

Yuki Tanabe is a prominent inventor based in Yamanashi, Japan. She has made significant contributions to the fields of gas processing and semiconductor technology. With a total of 2 patents, her work focuses on innovative methods that enhance efficiency and reliability in various applications.

Latest Patents

Yuki Tanabe's latest patents include an "Abnormality Detection Method and Processing Apparatus" and a "Method of Crystallizing Amorphous Silicon Film and Deposition Apparatus." The first patent outlines a method for detecting abnormalities in gas supply systems by measuring pressure within the gas pipe. This innovative approach allows for timely identification of potential issues, ensuring the integrity of the processing apparatus. The second patent describes a method for crystallizing amorphous silicon films, which involves heating the film at different temperatures to facilitate the migration of silicon and form crystal nuclei. This technique is crucial for improving the quality of silicon films used in various electronic devices.

Career Highlights

Yuki Tanabe is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. Her role involves research and development, where she applies her expertise to create advanced technologies that drive innovation in the field. Her contributions have been instrumental in enhancing the performance of semiconductor manufacturing processes.

Collaborations

Yuki collaborates with talented individuals such as Tatsuya Miyahara and Daisuke Suzuki. These partnerships foster a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Yuki Tanabe is a remarkable inventor whose work in gas processing and silicon film crystallization has made a significant impact on the semiconductor industry. Her innovative patents and collaborative spirit continue to drive advancements in technology.

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