Yukari Koibuchi

Title: Yukari Koibuchi: Photosensitive Resin Innovations

Introduction

Yukari Koibuchi is an inventor based in Hitachi, Japan, whose patent work focuses on photosensitive resin compositions and their applications in electronic components. She is associated with HD MicroSystems, Ltd. Her portfolio includes two patents.

Latest Patents

Koibuchi’s listed patents address materials and processes for producing cured patterns and protective or insulating layers.

- “Photosensitive Resin Composition, Method of Manufacturing Pattern Cured Product, Cured Product, Interlayer Insulating Film, Cover-Coat Layer, Surface Protective Film, and Electronic Component” describes a composition containing a polyimide precursor with a polymerizable unsaturated bond, a polymerizable monomer with an aliphatic cyclic skeleton, a photopolymerization initiator, and a solvent.

- “Photosensitive Resin Composition, Cured Pattern Production Method, Cured Product, Interlayer Insulating Film, Cover Coat Layer, Surface Protective Layer, and Electronic Component” describes a composition combining a specified polyimide precursor with compounds selected from two defined groups.

These inventions relate to photosensitive materials that can be patterned and cured for use in insulating and protective layers, as well as electronic components.

Career Highlights

Koibuchi’s patent record highlights work on polyimide-based photosensitive compositions and their manufacturing applications. The disclosed technologies connect material formulation with the production of cured patterns and functional layers.

Collaborations

Koibuchi’s listed coworkers include Nobuyuki Saito and Takashi Kawamori. Their names appear alongside her work in the context of related patent activity.

Conclusion

Yukari Koibuchi’s two patents reflect a focused contribution to photosensitive resin technologies for pattern formation, insulation, and protection in electronic components.