Yuichiro Sase is a prominent inventor based in Oshu, Japan. He has made significant contributions to the field of deposition technology, holding a total of five patents. His work focuses on advanced methods and apparatuses for film deposition, which are crucial in various industrial applications.

Latest Patents

One of Yuichiro Sase's latest patents is a deposition method and deposition apparatus. This apparatus includes a processing chamber, a rotary table, and multiple processing regions designed to enhance the efficiency of film deposition. The apparatus features a first heater and a plasma generator, which plays a vital role in the deposition process. Another notable patent is a method for depositing a silicon oxide film. This method utilizes Atomic Layer Deposition with plasma while heating the substrate to a temperature of 600° C. or higher, followed by an annealing process at a higher temperature.

Career Highlights

Yuichiro Sase is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative work has positioned him as a key figure in the development of advanced deposition technologies.

Collaborations

He has collaborated with notable coworkers, including Hitoshi Kato and Toru Ishii, contributing to the advancement of their shared projects and innovations.

Conclusion

Yuichiro Sase's contributions to the field of deposition technology are noteworthy, with several patents that reflect his expertise and innovative spirit. His work continues to influence the industry and pave the way for future advancements.

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