Tokyo, Japan

Yuhei Otomo

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuhei Otomo. Retrieved from https://idiyas.com/inventor/yuhei-otomo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yuhei Otomo: Innovator in Evaluation Technology

Introduction

Yuhei Otomo is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of evaluation technology, particularly through his innovative patent. His work is instrumental in advancing the capabilities of topography simulation.

Latest Patents

Yuhei Otomo holds a patent for an "Evaluation apparatus, evaluation method, and evaluation program." This evaluation apparatus includes a processor that performs various operations. These operations involve reading simulation parameters of a topography simulator and associated range information. The apparatus is designed to predict topography information of processed target objects under predetermined conditions, enhancing the accuracy of evaluations.

Career Highlights

Otomo is affiliated with Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His role at the company allows him to apply his expertise in evaluation technology to real-world applications. His innovative approach has positioned him as a key figure in his field.

Collaborations

Yuhei Otomo collaborates with talented coworkers, including Daishiro Akiyama and Yusuke Ogawa. Together, they work on advancing technologies that improve evaluation processes in various applications.

Conclusion

Yuhei Otomo's contributions to evaluation technology through his patent and work at Tokyo Electron Limited highlight his importance as an inventor. His innovative solutions continue to shape the future of topography simulation and evaluation methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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