This inventor holds 2 USPTO granted patents. Top assignee: Shanghai Huali Microelectronics Corporation. Active years: 2019.
Company Filing History:
Years Active: 2019
Title: Yueyu Zhang: Innovator in Photomask Technology
Introduction
Yueyu Zhang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of photomask technology, holding a total of 2 patents. His innovative approaches have advanced the methods used in semiconductor manufacturing.
Latest Patents
Yueyu Zhang's latest patents include the "OPC method for a pattern corner" and the "OPC method for a shallow ion implanting layer." The first patent discloses a method that involves providing a photomask with an original layout containing target patterns. This method focuses on modifying the original layout to achieve a corrected photomask through model-based OPC correction. The second patent outlines a method for a shallow ion implanting layer, detailing steps to select valid device regions and extend poly-silicon contacting regions to form a correction target layer.
Career Highlights
Yueyu Zhang is currently employed at Shanghai Huali Microelectronics Corporation. His work at this company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in microelectronics.
Collaborations
Yueyu Zhang has collaborated with notable coworkers, including Yue H Wang and Meng Kang. Their combined expertise has fostered a productive environment for innovation and development in their field.
Conclusion
Yueyu Zhang's contributions to photomask technology and his innovative patents highlight his role as a key figure in the semiconductor industry. His work continues to influence advancements in microelectronics and semiconductor manufacturing.