The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2019
Filed:
Nov. 01, 2017
Shanghai Huali Microelectronics Corporation, Shanghai, CN;
Yueyu Zhang, Shanghai, CN;
Yue Wang, Shanghai, CN;
SHANGHAI HUALI MICROELECTRONICS CORPORATION, Shanghai, CN;
Abstract
The present invention discloses an OPC method for a pattern corner, comprising the following steps of: S: providing a photomask which has an original layout containing target patterns, wherein the target patterns have at least one convex corner at a vertex of two first adjacent sides with an angle of 90-degree therebetween and at least one concave corner at a vertex of two second adjacent sides with an angle of 270-degree; S: modifying the original layout to obtain a modified layout by adding at least one first rectangular correction pattern from outside of the convex corner and/or removing at least one second rectangular correction pattern from inside of the concave corner; S: performing a model-based OPC correction to the modified layout to obtain a corrected photomask.