Taichung, Taiwan

Yueh-Ting Yang

This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2020-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yueh-Ting Yang. Retrieved from https://idiyas.com/inventor/yueh-ting-yang-apsbahez

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2020-2021

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2 patents (USPTO):Explore Patents

Title: Innovations by Yueh-Ting Yang in Semiconductor Fabrication

Introduction

Yueh-Ting Yang is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor fabrication, particularly through his innovative methods for controlling furnace temperatures during the manufacturing process.

Latest Patents

Yueh-Ting Yang holds two patents that focus on methods for processing semiconductor wafers in a furnace. His first patent describes a method for controlling the temperature of the furnace during the formation of a thin film on semiconductor wafers. This method involves a first thermal mode where the furnace's thermal zones are arranged in sequence, allowing for a controlled temperature increase. After the thin film formation, a purging gas is supplied into the furnace, followed by a second thermal mode that features a gradual temperature decrease across the thermal zones.

Career Highlights

Yueh-Ting Yang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor fabrication processes.

Collaborations

Yueh-Ting Yang has collaborated with notable colleagues, including Jian-Lun Lo and Jih-Churng Twu, who contribute to the innovative environment at their workplace.

Conclusion

Yueh-Ting Yang's contributions to semiconductor fabrication through his patented methods demonstrate his expertise and commitment to advancing technology in this critical field. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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