Rolla, MO, United States of America

Yubao Wang

USPTO Granted Patents = 10 

 

Average Co-Inventor Count = 4.2

ph-index = 4

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2010-2023

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10 patents (USPTO):Explore Patents

Title: Celebrating the Innovations of Yubao Wang: A Pioneer in Lithographic Compositions

Introduction

Yubao Wang is an accomplished inventor based in Rolla, MO, who has made significant contributions to the field of lithography. With a portfolio of ten patents, Wang's innovations are at the forefront of microelectronics, showcasing his expertise in developing advanced materials and methods for semiconductor processing.

Latest Patents

Yubao Wang's recent work includes notable patents that reflect his inventive prowess. His invention titled "High-silicon-content wet-removable planarizing layer" provides innovative lithographic compositions designed for use as wet-removable silicon gap fill layers. This method allows for the application of a silicon gap fill layer over topographical features on a substrate, which can be directly applied or positioned over any intermediate layers. The high silicon content in the polymeric compositions ensures excellent planarization performance and resistance to oxygen etching.

Another remarkable patent revolves around "Underlayers for EUV lithography." This invention offers new lithographic compositions tailored for use as EUV silicon hardmask layers. The innovative method improves adhesion while effectively reducing or eliminating pattern collapse issues, crucial for the fabrication of microelectronic structures. This process utilizes a silicon hardmask layer placed directly below the photoresist layer, significantly enhancing the functionality and precision of lithographic processes.

Career Highlights

Yubao Wang has established his career at Brewer Science, Inc., where he continues to push the boundaries of technology and innovation in the semiconductor industry. His focus on developing high-performance materials has positioned him as a key player in advancing microelectronic manufacturing techniques.

Collaborations

Throughout his career, Wang has collaborated with talented coworkers, including Vandana Krishnamurthy and Qin Lin. These collaborations have fostered an environment of innovation, leading to the development of groundbreaking technologies that benefit the entire semiconductor industry.

Conclusion

Yubao Wang's contributions to the field of lithography through his patents exemplify the spirit of innovation. His work not only enhances the performance of semiconductor manufacturing processes but also ensures the continued advancement of technology in the ever-evolving landscape of microelectronics. As an inventor, Wang's legacy will undoubtedly inspire future generations of innovators striving to make their mark in the world of invention.

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