Yuan-Sung Chang

Title: Innovations of Yuan-Sung Chang

Introduction

Yuan-Sung Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology. With a total of 2 patents to his name, his work has had a notable impact on the industry.

Latest Patents

Yuan-Sung Chang's latest patents include a method for fabricating semiconductor devices. This method involves providing a substrate with multiple pillars, forming trenches around each pillar, and placing a doped region at the bottom of each pillar. An insulation layer is formed below each doped region, and a gate along with a gate dielectric is created on the sidewalls of each pillar. Another significant patent is related to a semiconductor structure that features a semiconductor substrate with deep trenches and pillar structures. Each pillar structure consists of an upper and lower portion, with a doping region in the lower portion and a diffusion barrier layer on its sidewall.

Career Highlights

Yuan-Sung Chang is currently associated with Nan Ya Technology Corporation, where he continues to innovate in semiconductor technology. His expertise and dedication have positioned him as a key figure in his field.

Collaborations

Some of his notable coworkers include Chien-An Yu and Yi-Fong Lin, who contribute to the collaborative environment at Nan Ya Technology Corporation.

Conclusion

Yuan-Sung Chang's contributions to semiconductor technology through his patents and work at Nan Ya Technology Corporation highlight his importance as an inventor. His innovative methods and structures continue to influence the industry.