Yuan-Sheng Chiang

Title: Innovations of Yuan-Sheng Chiang

Introduction

Yuan-Sheng Chiang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. With a total of 3 patents to his name, his work focuses on innovative methods for fabricating conductive lines in semiconductor devices.

Latest Patents

One of his latest patents is titled "Method of fabricating conductive line of a semiconductor device." This patent discloses a method that includes the steps of sequentially forming a conductive material layer and a mask on a semiconductor substrate. The thickness of the conductive material layer is specified to be between 30,000 angstroms (Å) and 90,000 angstroms (Å). The method involves performing a first etching process to remove a part of the conductive material layer to form at least an upper side. Additionally, a second etching process is performed to remove a part of the conductive material layer to form at least a lower side, where the curvature of the upper side differs from that of the lower side.

Another patent is for a "Conductive line of semiconductor device." This invention includes a conductive layer disposed on a semiconductor substrate. The thickness of the conductive layer is substantially larger than 10,000 angstroms (Å), and at least one side of the conductive layer features at least two different values of curvature.

Career Highlights

Yuan-Sheng Chiang is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to further develop his innovative ideas and contribute to advancements in semiconductor technology.

Collaborations

Some of his notable coworkers include Mu-Chin Chen and Chi-Sheng Hsiung. Their collaboration has likely fostered an environment of innovation and creativity within their projects.

Conclusion

Yuan-Sheng Chiang's contributions to semiconductor technology through his patents demonstrate his expertise and commitment to innovation. His work continues to influence the field and pave the way for future advancements.