Yuan-Chun Chien

Title: Innovations by Yuan-Chun Chien

Introduction

Yuan-Chun Chien is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology. His work has led to advancements that enhance the efficiency and performance of semiconductor devices.

Latest Patents

Yuan-Chun Chien holds a patent for a semiconductor device that includes a dual damascene structure. The patent describes a method for fabricating the semiconductor device, which involves forming a metal layer embedded in a first dielectric layer. An etch stop layer is created over the metal layer and the first dielectric layer. A second dielectric layer is then formed over the etch stop layer. The process includes removing a portion of the second dielectric layer to expose the etch stop layer and forming a via through a dry etching process. Subsequently, the exposed portion of the etch stop layer is removed to reveal the metal layer, creating a damascene cavity through a wet etching process. Finally, a damascene structure is formed within the cavity.

Career Highlights

Yuan-Chun Chien is currently employed at Taiwan Semiconductor Manufacturing Company Limited. His work at this leading semiconductor manufacturer has allowed him to be at the forefront of technological advancements in the industry.

Collaborations

Yuan-Chun Chien has collaborated with Hung-Chun Chen, contributing to the development of innovative semiconductor solutions.

Conclusion

Yuan-Chun Chien's contributions to semiconductor technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor in the field. His innovations continue to shape the future of semiconductor devices.