This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 1999-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1999-2004
Title: Innovations of Yuan-Cheng Yu
Introduction
Yuan-Cheng Yu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to solving complex engineering challenges.
Latest Patents
One of his latest patents is titled "Variable transmission focal mask for lens heating compensation." This invention discloses a variable transmission focal mask designed to compensate for lens heating. The semiconductor fabrication alignment and exposure equipment includes an exposure and alignment unit, a variable transmission mask, and a stage. The unit is equipped with a light source and a lens, with the mask positioned under the lens to indirectly measure focus. The mask can adjust focus in real time when it detects that the focus is out of specification. A wafer is placed on the stage for exposure to the light source through a mask or a reticle. The variable transmission mask typically has a high transmission of light rating that can be adjusted downward to modify the focus. For instance, the mask can be a liquid crystal display (LCD) that can be darkened to reduce its light transmission rating.
Another significant patent by Yuan-Cheng Yu is the "Method of increasing end point detection capability of reactive ion." This method involves forming layers of polysilicon and dielectric layers in the manufacturing of a semiconductor device. It utilizes photolithography and etching process steps to pattern the layers into devices. The end point mode detection is employed in the etching process to enhance detection capacity by increasing the area exposed during etching, which includes adding a surplus pad area before pad formation. Specifically, an EPROM device is formed with a first level of polysilicon above a gate oxide layer, which is patterned into a floating gate electrode. The process continues with the formation of an ONO layer, defining array protection, growing a second gate oxide layer, and depositing a second level of polysilicon.
Career Highlights
Yuan-Cheng Yu is currently associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work has significantly impacted the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
He has collaborated with notable colleagues such as Tzong-Sheng Chang and Yen-Shih Ho, contributing to advancements in semiconductor technology.
Conclusion
Yuan-Cheng Yu's innovative patents and contributions to
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile