Yuan-Chen Hsu

Title: Innovations of Yuan-Chen Hsu

Introduction

Yuan-Chen Hsu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving processes related to semiconductor manufacturing, which is crucial for the advancement of electronic devices.

Latest Patents

One of his latest patents is titled "Phase control in contact formation." This method involves forming a first metallic feature, followed by the creation of a dielectric layer over it. The dielectric layer is then etched to expose the top surface of the first metallic feature through an opening. A first treatment is performed on this surface using a specific process gas, followed by a second treatment with a different gas, ultimately leading to the deposition of a second metallic feature in the opening.

Another notable patent is "Chemical vapor deposition for uniform tungsten growth." This patent describes low-flow tungsten chemical vapor deposition (CVD) techniques that ensure uniform deposition of tungsten on semiconductor substrates. By controlling the flow rate of tungsten hexafluoride, the process achieves a slower growth rate, promoting uniformity while increasing throughput in semiconductor device processing.

Career Highlights

Yuan-Chen Hsu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative approaches and patented methods have contributed to the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

He has collaborated with notable colleagues such as Pin-Wen Chen and Chun-Hsien Huang, further enhancing the impact of his work in the semiconductor field.

Conclusion

Yuan-Chen Hsu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in electronic device manufacturing.