Yu-Wei Jiang

Title: Yu-Wei Jiang: Innovator in Nano-Scaled Structures

Introduction

Yu-Wei Jiang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of nano-scaled structures, holding a total of 4 patents. His innovative work focuses on advanced methods and materials that enhance the fabrication of nano-scale devices.

Latest Patents

One of Yu-Wei Jiang's latest patents is the "Wave-shaped mask of fabricating nano-scaled structure." This invention discloses a wave-shaped mask that comprises an elastomeric transparent substrate with a periodic wave shape on its upper surface, designed for the precise fabrication of nano-scale structures. Another notable patent is the "Method of fabricating a polarized color filter." This method involves a transparent substrate coated with a photoresist layer, utilizing a wave-shaped mask to create a photoresist pattern layer through a series of exposure processes.

Career Highlights

Yu-Wei Jiang is affiliated with National Taiwan University, where he continues to advance research in nano-technology. His work has garnered attention for its potential applications in various fields, including optics and electronics.

Collaborations

Yu-Wei Jiang collaborates with esteemed colleagues such as Si-Chen Lee and Fang-Tzu Chuang, contributing to a dynamic research environment that fosters innovation.

Conclusion

Yu-Wei Jiang's contributions to the field of nano-scaled structures exemplify the impact of innovative thinking in technology. His patents reflect a commitment to advancing the capabilities of fabrication methods, paving the way for future developments in the industry.