The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8795928 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 05, 2014

Filed:

Mar. 16, 2012
Applicants:

Si-chen Lee, Taipei, TW;

Fang-tzu Chuang, Taipei, TW;

Yu-wei Jiang, New Taipei, TW;

Inventors:

Si-Chen Lee, Taipei, TW;

Fang-Tzu Chuang, Taipei, TW;

Yu-Wei Jiang, New Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2012.01); G03F 1/50 (2012.01); G03F 1/60 (2012.01);
U.S. Cl.
CPC ...
G03F 1/50 (2013.01); G03F 1/60 (2013.01);
Abstract

A wave-shaped mask for fabricating a nano-scale structure is disclosed. The wave-shaped mask comprises an elastomeric transparent substrate having an upper surface and a lower surface, and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate. The upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape, and the lower surface of the elastomeric transparent substrate is in a plate shape.


Find Patent Forward Citations

Lee, Si-Chen. (2014). Wave-shaped mask of fabricating nano-scaled structure (U.S. Patent No. 8795928). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8795928

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