This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2000-2003.
Location History:
- Taipei, TW (2000)
- You-Hou, TW (2001)
- Hsin-chu, TW (2003)
Company Filing History:
Years Active: 2000-2003
Title: Innovations of Yu-Sheng Shen
Introduction
Yu-Sheng Shen is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 3 patents. His work focuses on enhancing the efficiency and safety of polishing processes in semiconductor manufacturing.
Latest Patents
Yu-Sheng Shen's latest patents include an "Apparatus and method for retaining moisture on a polishing pad." This invention describes a circular disc designed to retain moisture on a polishing pad during machine idling, which is crucial for maintenance or repair. The apparatus features a clam-shell configuration for easy mounting and dismounting, ensuring that the polishing pad remains in optimal condition. Additionally, the moisture retention means can be provided in various forms, such as brushes or cellulosic material layers. Another significant patent is the "Apparatus and method for removing an adhesive bonded pad." This invention offers a safe and efficient way to remove polishing pads from backing plates, utilizing a T-shaped removal tool that operates with minimal force.
Career Highlights
Yu-Sheng Shen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in developing innovative solutions for the semiconductor industry. His inventions have contributed to improving the safety and effectiveness of polishing processes, which are critical in semiconductor fabrication.
Collaborations
Yu-Sheng Shen has collaborated with notable colleagues, including Chen-Chia Chiu and Yu-Chia Chang. Their teamwork has fostered an environment of innovation and creativity, leading to advancements in their respective fields.
Conclusion
Yu-Sheng Shen's contributions to the field of chemical mechanical polishing demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges faced in semiconductor manufacturing, and his work continues to influence the industry positively.