Taoyuan, Taiwan

Yu-Ling Liou

This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2015-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yu-Ling Liou. Retrieved from https://idiyas.com/inventor/yu-ling-liou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2015-2017

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2 patents (USPTO):Explore Patents

Title: Yu-Ling Liou: Innovator in Semiconductor Technology

Introduction

Yu-Ling Liou is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to material processing.

Latest Patents

One of Yu-Ling Liou's latest patents is titled "Uniform shallow trench isolation regions and the method of forming the same." This method involves performing a plasma treatment on a first surface of a first material and a second surface of a second material simultaneously. The first material is distinct from the second material, and a third material is formed on the treated surfaces. The materials involved may include a hard mask, a semiconductor material, and an oxide, respectively.

Career Highlights

Yu-Ling Liou is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in advancing the technology used in modern electronics.

Collaborations

Yu-Ling has collaborated with notable colleagues, including Chih-Tang Peng and Pei-Ren Jeng, who contribute to the dynamic research environment at their company.

Conclusion

Yu-Ling Liou's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods are paving the way for advancements in electronic materials and processing techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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