Taipei, Taiwan

Yu-Jun Chou

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2005.

USPTO Granted Patents = 1 

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Inventor Yu-Jun Chou: A Pioneer in Lithography Science

Introduction

Yu-Jun Chou, an esteemed inventor based in Taipei, Taiwan, has made significant contributions to the field of lithography. With a single patent to his name, his work focuses on enhancing the accuracy and efficiency of lithographic exposure tools in semiconductor manufacturing.

Latest Patents

Chou's patent, titled "Method of Defining Forbidden Pitches for a Lithography Exposure Tool," presents a groundbreaking approach to identifying and mitigating issues related to pitch variations in lithography. This method involves conducting computer simulations to assess frequently used pitches and their impact on depth-of-focus (DOF) values under specific exposure conditions. By performing verification tests with test masks, the actual DOF values are measured, allowing for the designation of certain pitches as forbidden. This innovation plays a crucial role in refining design rules for lithographic processes, ensuring higher reliability and performance in exposure tools.

Career Highlights

Currently, Yu-Jun Chou is associated with Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leader in the semiconductor industry. His work not only showcases his technical expertise but also demonstrates his commitment to advancing semiconductor manufacturing technologies.

Collaborations

Throughout his career, Chou has collaborated with notable colleagues such as Jaw-Jung Shin and Chun-Kuang Chen. Their collective efforts contribute to a rich collaborative environment, fostering innovation in lithography and semiconductor processing.

Conclusion

In sum, Yu-Jun Chou stands out as an influential figure in lithography, with his innovative patent offering critical insights into the management of pitch variations in exposure tools. His contributions to Taiwan Semiconductor Manufacturing Company Limited reinforce the importance of continuous research and development in the ever-evolving semiconductor field.

Profile summary based on public USPTO records.
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