This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Yu Jiang - Innovator in Plasma Etch Systems
Introduction
Yu Jiang is an inventor based in Hsinchu, Taiwan. He is known for his innovative contributions to the field of semiconductor manufacturing. His work focuses on enhancing etching processes, which are critical in the production of semiconductor devices.
Latest Patent Applications
Yu Jiang has filed a patent application for a "PLASMA ETCH SYSTEM INCLUDING TUNABLE PLASMA SHEATH." This application describes an etch tool that features a combination bottom shadow ring component. This component includes a moveable inner ring and a fixed inner ring. The moveable inner ring allows for adjustability in the effective thickness of the bottom shadow ring during etching operations. This tunability provides flexibility and accommodates changes in parameters related to various etch recipes for semiconductor substrates. Additionally, the fixed inner ring shadows beveled regions of the semiconductor substrate during etching, reducing the likelihood of damage to these regions.
Conclusion
Yu Jiang's innovative approach to plasma etch systems demonstrates his commitment to advancing semiconductor technology. His contributions, particularly through his latest patent application, highlight the importance of adaptability in manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile