Company Filing History:
Years Active: 2015-2025
Title: Innovator Spotlight: Yu-Chang Liang
Introduction: Yu-Chang Liang is a prominent inventor based in Kaohsiung, Taiwan, recognized for his contributions to semiconductor technology. With a robust portfolio comprising six patents, he has made significant strides in enhancing semiconductor structures and manufacturing processes.
Latest Patents: Yu-Chang Liang's recent patents include groundbreaking work on FinFETs with dummy fins. His innovative designs describe a semiconductor structure featuring a semiconductor fin that protrudes from a substrate in a specific orientation. This patent outlines a complex configuration where a dielectric fin, oriented perpendicularly to the semiconductor fin, defines its sidewalls. The dielectric fin comprises a first dielectric layer placed over a second layer, differing in composition, topped with a metal gate stack aligned along the same direction as the dielectric fin. This innovation enhances the efficiency and effectiveness of semiconductor devices.
Career Highlights: Yu-Chang Liang currently works at Taiwan Semiconductor Manufacturing Company Ltd. (TSMC), one of the world's leading semiconductor manufacturers. His expertise supports TSMC's mission to deliver advanced technologies and maintain its competitive edge in the semiconductor industry.
Collaborations: Collaboration is vital in the innovation process. Yu-Chang has worked alongside talented colleagues such as Chun-Hao Hsu and Yu-Chun Ko, bringing together their expertise to drive forward-thinking solutions in semiconductor technologies.
Conclusion: Yu-Chang Liang exemplifies the spirit of innovation within the semiconductor field through his cutting-edge patents and collaborative efforts. His work not only advances the technology but also establishes benchmarks for future innovations, making him a notable figure in the landscape of modern engineering.