This inventor holds 1 USPTO granted patent. Top assignee: Electronics and Telecommunications Research Institute. Active years: 1991.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1991
Title: Young K Choe: Innovator in X-ray Generation Systems
Introduction
Young K Choe is a notable inventor based in DaeJeon, South Korea. He has made significant contributions to the field of lithography through his innovative patent. His work focuses on enhancing the capabilities of X-ray generation systems, which are crucial for various research and commercial applications.
Latest Patents
Young K Choe holds a patent for an "X-ray generation system for an ultra fine lithography and a method." This system includes a center electrode with an adjusting member, a peripheral electrode featuring gas flow holes, and a metal disc designed to generate X-rays from plasma. Additionally, it incorporates a large capacitor, a transparent cylinder, a discharge member, and various other components that ensure continuous operation and increased stability. The system effectively controls and discharges the quantity of X-rays, making it highly suitable for both research and commercial use.
Career Highlights
Young K Choe is affiliated with the Electronics and Telecommunications Research Institute, where he continues to push the boundaries of technology in his field. His innovative approach has led to advancements that benefit both academic and industrial sectors.
Collaborations
Young K Choe has worked alongside talented colleagues, including Jeon Wook Yang and Jae Seung Lee. Their collaborative efforts contribute to the ongoing development of cutting-edge technologies in the realm of electronics and telecommunications.
Conclusion
Young K Choe's contributions to the field of X-ray generation systems exemplify the impact of innovation in technology. His work not only enhances research capabilities but also paves the way for future advancements in lithography applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
