The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 1991
Filed:
Dec. 29, 1989
Young K Choe, Daejeon-Si, KR;
Jeon W Yang, Daejeon-Si, KR;
Jin H Lee, Daejeon-Si, KR;
Jae S Lee, Daejeon-Si, KR;
Kyu H Shim, Cheongju-Si, KR;
Jin Y Kang, Daejeon-Si, KR;
Electronics and Telecommunications Research Institute, Chungnam, KR;
Abstract
An X-ray generation system for an ultra fine lithography includes a center electrode having an adjusting member, peripheral electrode having gas flow holes, a metal disc having gas flow holes for generating the X-ray from a plasma, a large capacitor, a transparent cylinder, a discharge member, Be discharge and observing windows, a cylindrical insulator, exhaust holes, a metal container, large electric power spatial gap switches, a current returning wire, an exhaust pump, and gas feeding members. Thereby, the system provides continuous operation and increased stability, controlling and discharging quantity so that the X-ray system can be easily utilized for researching and commercial applications.