Young Dong Lee

Title: Innovations of Young Dong Lee

Introduction

Young Dong Lee is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of plasma enhanced chemical vapor deposition. With a total of three patents to his name, Lee continues to push the boundaries of innovation in his industry.

Latest Patents

One of his latest patents focuses on film stress control for plasma enhanced chemical vapor deposition. This patent includes methods and apparatus for depositing a plurality of layers on a large area substrate. In one embodiment, a processing chamber for plasma deposition is provided. The processing chamber includes a showerhead and a substrate support assembly. The showerhead is coupled to an RF power source and a ground and includes a plurality of perforated gas diffusion members. A plurality of plasma applicators is disposed within the showerhead, wherein one plasma applicator of the plurality of plasma applicators corresponds to one of the plurality of perforated gas diffusion members. Further, a DC bias power source is coupled to a substrate support assembly.

Career Highlights

Young Dong Lee is currently employed at Applied Materials, Inc., where he applies his expertise in innovative technologies. His work has been instrumental in advancing the capabilities of plasma deposition processes.

Collaborations

Lee has collaborated with notable colleagues such as Chien-Teh Kao and Tae Kyung Won, contributing to various projects that enhance the field of chemical vapor deposition.

Conclusion

Young Dong Lee's contributions to the field of plasma enhanced chemical vapor deposition demonstrate his commitment to innovation and excellence. His patents and collaborations reflect his significant impact on the industry.