Young C Park

Title: Young C Park: Innovator in Wafer Edge Cleaning Technology

Introduction

Young C Park is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of wafer edge cleaning technology. With a total of 8 patents to his name, Park has established himself as a key figure in innovation within this industry.

Latest Patents

One of his latest inventions is the Rotating Belt Wafer Edge Cleaning Apparatus. This apparatus is designed to clean the edges and bevel areas of substrates effectively. In one embodiment, the invention provides a cleaning mechanism that utilizes friction at the contact point between the wafer and a rotating belt to remove particles from the edge of the wafer. This innovative approach enhances the efficiency of the cleaning process, which is crucial in semiconductor manufacturing.

Career Highlights

Throughout his career, Young C Park has worked with prominent companies in the technology sector. Notably, he has been associated with Intel Corporation and Lam Research Corporation. His experience in these leading firms has contributed to his expertise and the development of his patented technologies.

Collaborations

Some of his notable coworkers include Monsour Moinpour and Ilan Berman. Their collaboration has likely played a role in advancing the innovative projects they have worked on together.

Conclusion

Young C Park's contributions to wafer edge cleaning technology demonstrate his commitment to innovation in the semiconductor industry. His patents reflect a deep understanding of the challenges faced in manufacturing processes, and his work continues to influence the field.