Company Filing History:
Years Active: 2012-2025
Title: Youn-Jin Oh: Innovator in Semiconductor Etching Technologies
Introduction
Youn-Jin Oh is a prominent inventor based in San Ramon, CA (US). He has made significant contributions to the field of semiconductor technology, particularly in etching processes. With a total of 4 patents to his name, his work has advanced the capabilities of semiconductor manufacturing.
Latest Patents
Youn-Jin Oh's latest patents include innovative methods for etching recessed features on semiconductor substrates. One notable patent focuses on high aspect ratio dielectric etching with chlorine. This method allows for the formation of high-quality recessed features with a substantially vertical profile, low bowing, low twisting, and highly circular features. The techniques described can achieve these results with a high degree of selectivity and a relatively high etch rate. The etching process typically involves exposing the substrate to plasma generated from a processing gas that includes a chlorine source, a carbon source, a hydrogen source, and a fluorine source, often at low temperatures.
Another significant patent addresses the prevention of line bending and tilting during etching with a tri-layer mask. This method involves etching features in an etch layer using an organic mask layer and a hard mask as an etch mask. The hard mask is selectively etched away, allowing for precise feature etching in the underlying layer.
Career Highlights
Throughout his career, Youn-Jin Oh has worked with notable companies in the semiconductor industry, including Lam Research Corporation. His expertise in etching technologies has positioned him as a valuable asset in the field.
Collaborations
Youn-Jin Oh has collaborated with esteemed colleagues such as Cornelius F. Ivory and Sang M. Han. These collaborations have further enriched his work and contributed to advancements in semiconductor technologies.
Conclusion
Youn-Jin Oh's innovative contributions to semiconductor etching processes have significantly impacted the industry. His patents reflect a commitment to enhancing the quality and efficiency of semiconductor manufacturing.