Susono, Japan

Youhei Endo

This inventor holds 1 USPTO granted patent. Top assignee: Ulvac, Inc.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Youhei Endo. Retrieved from https://idiyas.com/inventor/youhei-endo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Youhei Endo: Innovator in Manufacturing Technology

Introduction

Youhei Endo is a notable inventor based in Susono, Japan. He has made significant contributions to the field of manufacturing technology, particularly through his innovative patent.

Latest Patents

Youhei Endo holds a patent for a manufacturing method and apparatus of a device. This method includes a first process in which a barrier film is formed on a substrate with a concave portion provided on one surface, covering the inner wall surface of the concave portion. The second process involves forming a conductive film over the barrier film. The third process entails melting the conductive film using a reflow method. Additionally, the method incorporates a process α between the second and third processes, where the substrate with the barrier film and conductive film is exposed to a specific atmosphere under a defined pressure for a set time period. This innovative approach ensures that the product of the pressure and time does not exceed 6×10[Pa·s].

Career Highlights

Youhei Endo is currently employed at Ulvac, Inc., where he continues to develop and refine manufacturing technologies. His work has been instrumental in advancing the capabilities of device manufacturing.

Collaborations

He collaborates with talented coworkers, including Shuji Kodaira and Yuta Sakamoto, who contribute to the innovative environment at Ulvac, Inc.

Conclusion

Youhei Endo's contributions to manufacturing technology through his patent demonstrate his commitment to innovation and excellence in the field. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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