This inventor holds 1 USPTO granted patent. Top assignees: Mattson Technology, Inc, University of California. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2005
Title: You-Sheng Lin: Innovator in High-Dielectric Coatings
Introduction
You-Sheng Lin is a notable inventor based in Downey, California, recognized for his contributions to the field of semiconductor technology. He holds a patent for a method that enhances the deposition of high-k dielectric coatings, which are crucial for modern electronic devices. His innovative approach has implications for improving the performance and efficiency of semiconductor components.
Latest Patents
You-Sheng Lin's patent, titled "Method for depositing a coating having a relatively high dielectric constant onto a substrate," outlines a sophisticated technique for applying a high-k dielectric coating onto substrates such as semiconductor wafers. The method involves subjecting the substrate to one or more reaction cycles, where it is heated to a specific deposition temperature. During these cycles, reactive organo-metallic gas precursors are introduced into the reactor vessel, along with an oxidizing gas at a designated oxidizing temperature. This process results in the formation of a metal oxide coating with a thickness of at least one monolayer, often achieving a dielectric constant greater than 4, and in some cases, ranging from 10 to 80.
Career Highlights
Throughout his career, You-Sheng Lin has worked with prominent organizations, including Mattson Technology, Inc. and the University of California. His experience in these institutions has allowed him to refine his expertise in semiconductor technologies and contribute to advancements in the field.
Collaborations
You-Sheng Lin has collaborated with notable professionals such as Michael Sendler and Avishai Kepten. These partnerships have facilitated the exchange of ideas and fostered innovation in the development of high-dielectric materials.
Conclusion
You-Sheng Lin's work in the field of high-dielectric coatings exemplifies the importance of innovation in semiconductor technology. His patented method not only enhances the performance of electronic devices but also showcases the potential for future advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile