The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2005
Filed:
Mar. 19, 2002
Jane Chang, Los Angeles, CA (US);
You-sheng Lin, Downey, CA (US);
Avishai Kepten, D.N. Bikaht Beit Cerem, IL;
Michael Sendler, Boise, ID (US);
Sagy Levy, Sunnyvale, CA (US);
Robin Bloom, Petaluma, CA (US);
Jane Chang, Los Angeles, CA (US);
You-Sheng Lin, Downey, CA (US);
Avishai Kepten, D.N. Bikaht Beit Cerem, IL;
Michael Sendler, Boise, ID (US);
Sagy Levy, Sunnyvale, CA (US);
Robin Bloom, Petaluma, CA (US);
Mattson Technology, Inc., Fremont, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
A method for depositing a high-k dielectric coating onto a substrate, such as a semiconductor wafer, is provided. The substrate is subjected to one or more reaction cycles. For instance, in a typical reaction cycle, the substrate is heated to a certain deposition temperature. Thereafter, in one embodiment, one or more reactive organo-metallic gas precursors are supplied to the reactor vessel. An oxidizing gas is also supplied to the substrate at a certain oxidizing temperature to oxidize and/or densify the layers. As a result, a metal oxide coating is formed that has a thickness equal to at least about one monolayer, and in some instances, two or more monolayers. The dielectric constant of the resulting metal oxide coating is often greater than about 4, and in some instance, is from about 10 to about 80.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile