Yokosuka, Japan

Yoshiyuki Yonezawa


Average Co-Inventor Count = 5.9

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2005-2007

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3 patents (USPTO):Explore Patents

Title: **Yoshiyuki Yonezawa: Pioneer in Thin Film Device Technology**

Introduction

Yoshiyuki Yonezawa, an esteemed inventor based in Yokosuka, Japan, has made significant contributions to the field of thin film devices. With a total of three patents to his name, his innovative work primarily focuses on epitaxial growth methods for enhancing the performance of thin film devices.

Latest Patents

Yonezawa's latest patents include groundbreaking inventions in thin film device technology. One of his notable inventions describes a thin film device comprising a metal sulfide layer formed on a single crystal silicon substrate through epitaxial growth. This device incorporates a compound thin film with ionic bonding, also formed via epitaxial growth. Specifically, he details the creation of (110) surface AlN/MnS/Si (100) thin films, which involve stacking MnS and AlN layers on a single crystal Si substrate to fabricate a light-emitting layer. His other patent highlights a method for creating a thin film device where ionic crystals are epitaxially grown on a silicon substrate utilizing a buffer layer, enhancing crystallinity and surface flatness, which in turn improves the characteristics of the device.

Career Highlights

Yonezawa's career is marked by his association with prestigious institutions, including the Tokyo Institute of Technology and the National Institute for Materials Science. His work in these organizations has allowed him to delve deeply into research and development of advanced materials and fabrication methods, positioning him as a leader in the field of thin film technology.

Collaborations

Throughout his career, Yonezawa has collaborated with distinguished colleagues, including Hideomi Koinuma and Yoshinori Konishi. These partnerships have facilitated the exchange of ideas and have significantly contributed to the advancements in thin film devices and related technologies.

Conclusion

Yoshiyuki Yonezawa's contributions to the field of thin film devices through his innovative patents and collaborative efforts illustrate his commitment to advancing technology. His work not only enhances the performance of electronic devices but also paves the way for future innovations in the semiconductor industry.

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