Yoshitsugu Kawamura

Title: Innovations of Yoshitsugu Kawamura

Introduction

Yoshitsugu Kawamura is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced polyimide films and processing apparatus for substrates. With a total of three patents to his name, Kawamura's work showcases his innovative approach to solving complex engineering challenges.

Latest Patents

One of Kawamura's latest patents is a method for producing porous polyimide film. This method effectively suppresses the occurrence of curling in the polyimide-fine particle composite film obtained by firing the unfired composite film. The process involves forming an unfired composite film using a varnish that contains a resin including polyamide acid and/or polyimide, fine particles, and a solvent. The unfired composite film is then immersed in a solvent containing water, followed by firing to obtain the polyimide-fine particle composite film, and finally removing the fine particles from the composite film.

Another significant patent is related to a processing apparatus for substrates. This invention aims to shorten the time required for introducing an inactive gas, such as nitrogen gas, into a load lock chamber of the processing apparatus. The design includes a buffer tank with a capacity larger than that of the load lock chamber, which allows for efficient gas introduction during processing within the chamber.

Career Highlights

Kawamura has worked with prominent companies in the industry, including Tokyo Ohka Kogyo Co., Ltd. and Tokyo Ohka Co., Ltd. His experience in these organizations has contributed to his expertise in materials processing and innovation.

Collaborations

Throughout his career, Kawamura has collaborated with notable colleagues such as Akira Uehara and Mitsuaki Minato. These partnerships have likely fostered a creative environment that has led to the development of his innovative patents.

Conclusion

Yoshitsugu Kawamura's contributions to the field of materials science through his patents reflect his dedication to innovation and problem-solving. His work continues to influence advancements in the production of polyimide films and substrate processing technologies.