Ibaraki, Japan

Yoshio Ota

This inventor holds 2 USPTO granted patents. Top assignee: Nitto-Denko Corporation. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshio Ota. Retrieved from https://idiyas.com/inventor/yoshio-ota-5gvo4wbv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2012

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2 patents (USPTO):Explore Patents

Title: Innovations of Yoshio Ota in Substrate Processing Equipment

Introduction

Yoshio Ota is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of substrate processing equipment, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of particle removal in various applications.

Latest Patents

Ota's latest patents include a particle removing member of substrate processing equipment. This invention features a particle removing layer designed to ensure that the signal intensity of free induction decay, measured by a pulse NMR-Solid Echo method, decays to 37% of its initial value at a measurement temperature of 100 degrees centigrade within 1000 microseconds or less. The invention also includes a particle removing sheet that incorporates this layer on a support, as well as a conveying member with a particle removing function. This innovative approach allows for the convenient and assured removal of adhered foreign matter during substrate processing.

Career Highlights

Yoshio Ota is currently employed at Nitto Denko Corporation, where he continues to develop and refine technologies related to substrate processing. His expertise in this area has led to advancements that improve the reliability and efficiency of particle removal methods.

Collaborations

Ota collaborates with Koichi Hashimoto, contributing to the development of innovative solutions in their field. Their combined efforts aim to push the boundaries of technology in substrate processing.

Conclusion

Yoshio Ota's contributions to substrate processing equipment through his patents demonstrate his commitment to innovation and excellence in engineering. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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