Nitto-denko Corporation

Yoshio Ota

Koichi Hashimoto

The present invention is a particle removing member of a substrate processing equipment including a particle removing layer in which a time necessary for a signal intensity of free induction decay measured by a pulse NMR-Solid Echo method to decay to 37% of an initial value at a measurement temperature of 100 degrees centigrade is 1000 &#x3bc;s or less, in particular, a particle removing sheet including the above-constituted particle removing layer on a support, and a conveying member with particle removing function formed by adhering the above-constituted particle removing sheet on the conveying member, and furthermore a method of removing particle of a substrate processing equipment, including conveying the above-constituted conveying member with particle removing function into a substrate processing equipment.

Particle removing member of substrate processing equipment

The present invention intends to provide a particle removing member of a substrate processing equipment which can be assuredly conveyed into the substrate processing equipment and can conveniently and assuredly remove an adhered foreign matter, and a particle removing method of a substrate processing equipment that uses the particle removing member. A particle removing member of a substrate processing equipment comprising a particle removing layer in which a time necessary for a signal intensity of free induction decay measured by a pulse NMR-Solid Echo method to decay to 37% of an initial value at a measurement temperature of 100 degrees centigrade is 1000 &#x3bc;s or less, in particular, a particle removing sheet comprising the above-constituted particle removing layer on a support, and a conveying member with particle removing function formed by adhering the above-constituted particle removing sheet on the conveying member, and furthermore a method of removing particle of a substrate processing equipment, comprising conveying the above-constituted conveying member with particle removing function into a substrate processing equipment.

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Ibaraki, Japan

Yoshio Ota