Miyagi, Japan

Yoshinobu Shiba



Average Co-Inventor Count = 4.9

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Sendai, JP (2020)
  • Miyagi, JP (2021 - 2022)

Company Filing History:


Years Active: 2020-2022

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Yoshinobu Shiba

Introduction: Yoshinobu Shiba is a notable inventor based in Miyagi, Japan, recognized for his significant contributions to the field of materials science and engineering. With three patents to his name, Shiba has focused on advancements in silicon nitride films, which are essential for various technological applications.

Latest Patents: Shiba's latest patents demonstrate his innovative approach to the production of silicon nitride films. One of his patents describes a method for producing silicon nitride film that achieves a high deposition rate while minimizing damage to the substrate and underlying layer. This process involves irradiating a nitride with ultraviolet light and then engaging it with a hydrogenated cyclic silane represented by a general formula SiH, where n is 5, 6, or 7. Another noteworthy patent outlines a method of forming a nitride film through a well-defined procedure. This includes supplying a silane-based gas to a processing chamber, introducing a nitrogen radical gas from a radical generator, and facilitating a reaction without causing a plasma phenomenon, resulting in a nitride film being formed on a wafer.

Career Highlights: Yoshinobu Shiba has held significant roles in leading companies such as Toshiba Mitsubishi-Electric Industrial Systems Corporation and Tohoku University. His work in these organizations has further propelled his research and has been crucial in developing techniques that enhance the fabrication of semiconductor materials.

Collaborations: Throughout his career, Shiba has collaborated with esteemed professionals in his field, including Akinobu Teramoto and Tomoyuki Suwa. These partnerships have enriched his research initiatives and contributed to the success of his innovative projects.

Conclusion: In summary, Yoshinobu Shiba's inventive spirit and dedication to advancing materials science are exemplified through his patents and collaborations. His contributions, especially in the area of silicon nitride films, underscore the importance of innovation in technology and hold promise for future developments in the industry.

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