Tokyo, Japan

Yoshimi Hamano

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Resonac Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshimi Hamano. Retrieved from https://idiyas.com/inventor/yoshimi-hamano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovations of Yoshimi Hamano

Introduction

Yoshimi Hamano is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of semiconductor technology. Her work focuses on photosensitive resin compositions, which are crucial for various applications in electronics.

Latest Patents

Yoshimi Hamano holds a patent for a photosensitive resin composition, which includes an alkali-soluble resin with an imide bond and a phenolic hydroxyl group. This composition also features a compound that generates acid upon exposure to light. The patent encompasses a method for producing a patterned cured film, the patterned cured film itself, and a semiconductor element. This innovation is vital for advancing semiconductor manufacturing processes.

Career Highlights

Hamano is currently employed at Resonac Corporation, where she continues to develop innovative materials for the semiconductor industry. Her expertise in photosensitive materials has positioned her as a key figure in her field.

Collaborations

Yoshimi collaborates with talented coworkers, including Yu Aoki and Masahiro Hashimoto. Their combined efforts contribute to the advancement of technology in their respective areas of expertise.

Conclusion

Yoshimi Hamano's work in photosensitive resin compositions showcases her innovative spirit and dedication to the semiconductor industry. Her contributions are paving the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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