Kawasaki, Japan

Yoshiki Sakuma



Average Co-Inventor Count = 1.7

ph-index = 7

Forward Citations = 460(Granted Patents)


Location History:

  • Kawasaki, JP (1993 - 2002)
  • Ebina, JP (2004)

Company Filing History:


Years Active: 1993-2004

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12 patents (USPTO):Explore Patents

Title: Innovations of Yoshiki Sakuma

Introduction

Yoshiki Sakuma is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

Among his latest patents, Sakuma has developed a semiconductor device that includes a channel layer, a gate electrode formed on the channel layer, a p-type source region on one side, and a p-type drain region on the opposite side. This innovative design incorporates a heavy-hole band and a light-hole band that are separated by compressive strain applied isotropically in the channel layer. Additionally, he has patented a photodetector featuring a mixed crystal layer of SiGeC, which includes a substrate and an optical absorption layer made from a mixed crystal of silicon, germanium, and carbon.

Career Highlights

Yoshiki Sakuma is currently employed at Fujitsu Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing advanced devices that improve electronic performance.

Collaborations

Sakuma has collaborated with notable colleagues such as Yoshihiro Sugiyama and Masashi Ozeki, contributing to various projects that enhance the capabilities of semiconductor devices.

Conclusion

Yoshiki Sakuma's innovative work in semiconductor technology has led to numerous patents and advancements in the field. His contributions continue to shape the future of electronic devices and systems.

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