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Yoshiki Kida

USPTO Granted Patents = 12 (Patent Applications = 2)

Average Co-Inventor Count = 1.8

ph-index = 5

Forward Citations = 105(Granted Patents)

Location History:

Kawasaki, JP (2000 - 2005)
Tokyo, JP (2001 - 2011)
Kita-ku, JP (2011 - 2014)
Kounosu, JP (2015 - 2016)

Company Filing History:

Years Active: 2000-2016

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9239524 - Exposure condition determination method, exposure method, exposure apparatus, and device manufacturing method involving detection of the situation of a liquid immersion region (2016-01-19),

2. 9025126 - Exposure apparatus adjusting method, exposure apparatus, and device fabricating method (2015-05-05),

3. 8913224 - Exposure apparatus, exposure method, and device producing method (2014-12-16),

4. 8035799 - Exposure apparatus, exposure method, and device producing method (2011-10-11),

5. 7872476 - NMR probe (2011-01-18),

6. 7714579 - NMR probe (2010-05-11),

7. 6900880 - Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method (2005-05-31),

8. 6680611 - Local signal-supplying device for NMR spectrometer (2004-01-20),

9. 6577382 - Substrate transport apparatus and method (2003-06-10),

10. 6400445 - Method and apparatus for positioning substrate (2002-06-04),

11. 6225012 - Method for positioning substrate (2001-05-01),

12. 6141108 - Position control method in exposure apparatus (2000-10-31),

Title: The Innovative Contributions of Yoshiki Kida

Introduction

Yoshiki Kida is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of technology, particularly in the area of exposure methods and apparatuses. With a total of 12 patents to his name, Kida's work has had a substantial impact on device manufacturing processes.

Latest Patents

Kida's latest patents include an exposure condition determination method, an exposure method, an exposure apparatus, and a device manufacturing method involving the detection of the situation of a liquid immersion region. This innovative method detects the situation of a liquid immersion region formed on the surface of a substrate while changing at least one of the movement conditions of the substrate and the liquid immersion condition. The exposure condition is then determined based on the detection results. Another notable patent is an adjusting method for an immersion exposure apparatus, which involves holding a thermometer with both the first and second holders to adjust the temperature based on detection results.

Career Highlights

Throughout his career, Yoshiki Kida has worked with renowned companies such as Nikon Corporation and Jeol Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the field of exposure apparatuses.

Collaborations

Kida has collaborated with notable coworkers, including Kenji Nishi and Masahiko Okumura. Their combined expertise has fostered an environment of innovation and creativity, leading to the development of advanced technologies.

Conclusion

Yoshiki Kida's contributions to the field of technology through his patents and collaborations highlight his role as a leading inventor. His innovative methods and apparatuses continue to influence the industry and pave the way for future advancements.

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