Location History:
- Sunnyvale, CA (US) (2012)
- Boise, ID (US) (2003 - 2015)
Company Filing History:
Years Active: 2003-2015
Title: Innovations by Yoshiki Hishiro
Introduction
Yoshiki Hishiro is a prominent inventor based in Boise, ID (US). He has made significant contributions to the field of photoresist technology, holding a total of 18 patents. His work focuses on methods that enhance the stability and performance of photoresist patterns used in lithography.
Latest Patents
Hishiro's latest patents include innovative methods for eliminating pattern collapse on photoresist patterns. One of his notable inventions is a stabilizing solution that treats photoresist patterns to prevent profile abnormalities, toppling, and resist footing. This solution comprises a non-volatile component, such as non-volatile particles or polymers, which is applied after the photoresist material has been developed. By treating the photoresist with this solution after developing but before drying, the non-volatile component fills the space between adjacent resist patterns and remains on the substrate during drying. This provides structural and mechanical support for the resist, preventing deformation or collapse due to liquid surface tension forces.
Another significant patent involves methods of lithographically patterning a substrate. This method includes exposing the non-removal areas of photoresist to radiation to increase outer surface roughness while ensuring that the photoresist solubility remains unchanged in the developer. This allows for effective clearing of the photoresist from the removal areas while leaving the non-removal areas with enhanced surface roughness.
Career Highlights
Yoshiki Hishiro is currently employed at Micron Technology Incorporated, where he continues to innovate in the field of semiconductor manufacturing. His expertise in photoresist technology has positioned him as a key contributor to advancements in lithography processes.
Collaborations
Hishiro has collaborated with notable colleagues, including Jon Daley and Lijing Gou, to further enhance the development of photoresist technologies.
Conclusion
Yoshiki Hishiro's contributions to the field of photoresist technology through his innovative patents have significantly impacted the semiconductor industry. His work continues to pave the way for advancements in lithography and patterning techniques.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.