Yoshihiro Hosaka

This inventor holds 13 USPTO granted patents. Top assignees: Japan Synthetic Rubber Co., Ltd., Jsr Corporation. Active years: 1981-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshihiro Hosaka. Retrieved from https://idiyas.com/inventor/yoshihiro-hosaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 13

% Patents Active = 100.0

Average Co-Inventor Count = 4.2

ph-index = 10

Forward Citations = 221(Granted Patents)

Company Filing History:

9 out of 377

Japan Synthetic Rubber Co., Ltd.

Years Active: 1981-2001

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6270939 - Radiation-sensitive resin composition (2001-08-07),

2. 6228554 - Radiation-sensitive resin composition (2001-05-08),

3. 6020104 - Radiation-sensitive resin composition utilizing monooxymonocarboxylic (2000-02-01),

4. 5925492 - Radiation-sensitive resin composition utilizing monooxymonocarboxylic (1999-07-20),

5. 5494784 - Method of pattern formation utilizing radiation-sensitive resin (1996-02-27),

6. 5405720 - Radiation-sensitive composition containing 1,2 quinonediazide compound, (1995-04-11),

7. 5238774 - Radiation-sensitive composition containing 1,2-quinonediazide compound, (1993-08-24),

8. 5215857 - 1,2-quinonediazide containing radiation-sensitive resin composition (1993-06-01),

9. 5087548 - Positive type radiation-sensitive resin composition (1992-02-11),

10. 4923948 - Curable composition (1990-05-08),

11. 4499171 - Positive type photosensitive resin composition with at least two (1985-02-12),

12. 4384037 - Positive type photosensitive resin composition (1983-05-17),

13. 4275142 - Photosensitive compositions and printing plates containing same (1981-06-23),

Title: Yoshihiro Hosaka: Innovator in Radiation-Sensitive Resin Compositions

Introduction

Yoshihiro Hosaka is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions, holding a total of 13 patents. His work is particularly relevant in the manufacturing of integrated circuits, showcasing his expertise and innovation in this specialized area.

Latest Patents

Among his latest patents, Yoshihiro Hosaka has developed a radiation-sensitive resin composition. This composition comprises a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent that includes a monooxymonocarboxylic acid ester. Notably, this composition exhibits high storage stability, meaning that a very small amount of fine particles are formed during storage. This makes it particularly suited for use as a resist in the production of integrated circuits.

Career Highlights

Throughout his career, Yoshihiro Hosaka has worked with notable companies, including Japan Synthetic Rubber Co., Ltd. and JSR Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in resin technology.

Collaborations

Yoshihiro has collaborated with esteemed colleagues such as Yoshiyuki Harita and Ikuo Nozue. These partnerships have further enriched his work and expanded the impact of his innovations.

Conclusion

Yoshihiro Hosaka's contributions to radiation-sensitive resin compositions have positioned him as a key figure in the field of integrated circuit manufacturing. His innovative patents and collaborations reflect his dedication to advancing technology in this area.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]